Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters

dc.creator	Hwu, J.R.
dc.creator	Tsay, Shwu-Chen
dc.creator	Hung, S.C.
dc.creator	Hsu, M.-H.
dc.creator	Ma, J.-Y.
dc.creator	Mitić, Vojislav V.
dc.creator	Lazović, Goran
dc.creator	Chou, S.-S.P.
dc.date.accessioned	2022-09-19T19:22:28Z
dc.date.available	2022-09-19T19:22:28Z
dc.date.issued	2021
dc.identifier.uri	https://machinery.mas.bg.ac.rs/handle/123456789/3630
dc.description.abstract	Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage.	en
dc.publisher	De Gruyter
dc.rights	restrictedAccess
dc.source	Advanced Ceramics and Applications
dc.title	Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters	en
dc.type	bookPart
dc.rights.license	ARR
dc.citation.epage	108
dc.citation.other	: 101-108
dc.citation.spage	101
dc.identifier.doi	10.1515/9783110627992-008
dc.identifier.scopus	2-s2.0-85127706537
dc.type.version	publishedVersion

Документи

Датотеке	Величина	Формат	Преглед
Уз овај запис нема датотека.