Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters
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Hwu, J.R.Tsay, Shwu-Chen
Hung, S.C.
Hsu, M.-H.
Ma, J.-Y.
Mitić, Vojislav V.
Lazović, Goran
Chou, S.-S.P.
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Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage.
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Advanced Ceramics and Applications, 2021, 101-108Publisher:
- De Gruyter
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Mašinski fakultetTY - CHAP AU - Hwu, J.R. AU - Tsay, Shwu-Chen AU - Hung, S.C. AU - Hsu, M.-H. AU - Ma, J.-Y. AU - Mitić, Vojislav V. AU - Lazović, Goran AU - Chou, S.-S.P. PY - 2021 UR - https://machinery.mas.bg.ac.rs/handle/123456789/3630 AB - Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage. PB - De Gruyter T2 - Advanced Ceramics and Applications T1 - Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters EP - 108 SP - 101 DO - 10.1515/9783110627992-008 ER -
@inbook{ author = "Hwu, J.R. and Tsay, Shwu-Chen and Hung, S.C. and Hsu, M.-H. and Ma, J.-Y. and Mitić, Vojislav V. and Lazović, Goran and Chou, S.-S.P.", year = "2021", abstract = "Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage.", publisher = "De Gruyter", journal = "Advanced Ceramics and Applications", booktitle = "Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters", pages = "108-101", doi = "10.1515/9783110627992-008" }
Hwu, J.R., Tsay, S., Hung, S.C., Hsu, M.-H., Ma, J.-Y., Mitić, V. V., Lazović, G.,& Chou, S.-S.P.. (2021). Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters. in Advanced Ceramics and Applications De Gruyter., 101-108. https://doi.org/10.1515/9783110627992-008
Hwu J, Tsay S, Hung S, Hsu M, Ma J, Mitić VV, Lazović G, Chou S. Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters. in Advanced Ceramics and Applications. 2021;:101-108. doi:10.1515/9783110627992-008 .
Hwu, J.R., Tsay, Shwu-Chen, Hung, S.C., Hsu, M.-H., Ma, J.-Y., Mitić, Vojislav V., Lazović, Goran, Chou, S.-S.P., "Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters" in Advanced Ceramics and Applications (2021):101-108, https://doi.org/10.1515/9783110627992-008 . .