Prikaz osnovnih podataka o dokumentu
Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters
dc.creator | Hwu, J.R. | |
dc.creator | Tsay, Shwu-Chen | |
dc.creator | Hung, S.C. | |
dc.creator | Hsu, M.-H. | |
dc.creator | Ma, J.-Y. | |
dc.creator | Mitić, Vojislav V. | |
dc.creator | Lazović, Goran | |
dc.creator | Chou, S.-S.P. | |
dc.date.accessioned | 2022-09-19T19:22:28Z | |
dc.date.available | 2022-09-19T19:22:28Z | |
dc.date.issued | 2021 | |
dc.identifier.uri | https://machinery.mas.bg.ac.rs/handle/123456789/3630 | |
dc.description.abstract | Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage. | en |
dc.publisher | De Gruyter | |
dc.rights | restrictedAccess | |
dc.source | Advanced Ceramics and Applications | |
dc.title | Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters | en |
dc.type | bookPart | |
dc.rights.license | ARR | |
dc.citation.epage | 108 | |
dc.citation.other | : 101-108 | |
dc.citation.spage | 101 | |
dc.identifier.doi | 10.1515/9783110627992-008 | |
dc.identifier.scopus | 2-s2.0-85127706537 | |
dc.type.version | publishedVersion |
Dokumenti
Datoteke | Veličina | Format | Pregled |
---|---|---|---|
Uz ovaj zapis nema datoteka. |