4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance
Само за регистроване кориснике
2013
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
4H-SiC VDMOS is a peculiar semiconductor structure with two considerably different recognized regions. One of them is a vertical drift region, whereas the other one appears as a horizontal channel with its left and right sections corresponding to source bias. In each of these regions current-voltage characterisic can become saturated regardless of the status of the other region, thus making possible several operation modes of the considered devices. The investigation of the onset of these saturations in their order of appearance is the goal of this paper.
Кључне речи:
Drift-region saturation / Channel saturation / 4H-SiC VDMOSИзвор:
Optoelectronics and Advanced Materials-Rapid Communications, 2013, 7, 5-6, 329-333Издавач:
- Natl Inst Optoelectronics, Bucharest-Magurele
Финансирање / пројекти:
- Оптоелектронски нанодимензиони системи - пут ка примени (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45003)
Колекције
Институција/група
Mašinski fakultetTY - JOUR AU - Abood, Imhammad AU - Lukić, Petar AU - Šašić, Rajko M. AU - Alkoash, Abed Alkhem AU - Ostojić, Stanko M. PY - 2013 UR - https://machinery.mas.bg.ac.rs/handle/123456789/1730 AB - 4H-SiC VDMOS is a peculiar semiconductor structure with two considerably different recognized regions. One of them is a vertical drift region, whereas the other one appears as a horizontal channel with its left and right sections corresponding to source bias. In each of these regions current-voltage characterisic can become saturated regardless of the status of the other region, thus making possible several operation modes of the considered devices. The investigation of the onset of these saturations in their order of appearance is the goal of this paper. PB - Natl Inst Optoelectronics, Bucharest-Magurele T2 - Optoelectronics and Advanced Materials-Rapid Communications T1 - 4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance EP - 333 IS - 5-6 SP - 329 VL - 7 UR - https://hdl.handle.net/21.15107/rcub_technorep_2417 ER -
@article{ author = "Abood, Imhammad and Lukić, Petar and Šašić, Rajko M. and Alkoash, Abed Alkhem and Ostojić, Stanko M.", year = "2013", abstract = "4H-SiC VDMOS is a peculiar semiconductor structure with two considerably different recognized regions. One of them is a vertical drift region, whereas the other one appears as a horizontal channel with its left and right sections corresponding to source bias. In each of these regions current-voltage characterisic can become saturated regardless of the status of the other region, thus making possible several operation modes of the considered devices. The investigation of the onset of these saturations in their order of appearance is the goal of this paper.", publisher = "Natl Inst Optoelectronics, Bucharest-Magurele", journal = "Optoelectronics and Advanced Materials-Rapid Communications", title = "4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance", pages = "333-329", number = "5-6", volume = "7", url = "https://hdl.handle.net/21.15107/rcub_technorep_2417" }
Abood, I., Lukić, P., Šašić, R. M., Alkoash, A. A.,& Ostojić, S. M.. (2013). 4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance. in Optoelectronics and Advanced Materials-Rapid Communications Natl Inst Optoelectronics, Bucharest-Magurele., 7(5-6), 329-333. https://hdl.handle.net/21.15107/rcub_technorep_2417
Abood I, Lukić P, Šašić RM, Alkoash AA, Ostojić SM. 4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance. in Optoelectronics and Advanced Materials-Rapid Communications. 2013;7(5-6):329-333. https://hdl.handle.net/21.15107/rcub_technorep_2417 .
Abood, Imhammad, Lukić, Petar, Šašić, Rajko M., Alkoash, Abed Alkhem, Ostojić, Stanko M., "4H-SiC VDMOS - drift-region saturation, channel saturation and their order of appearance" in Optoelectronics and Advanced Materials-Rapid Communications, 7, no. 5-6 (2013):329-333, https://hdl.handle.net/21.15107/rcub_technorep_2417 .